# Susceptors and wafer carriers

High-purity graphite susceptors, wafer carriers and boats for epitaxy and CVD.

Family: Semiconductor applications

## Description
The **place** is an epitaxy reactor or a CVD chamber. The **application** is the graphite susceptor, wafer carrier or boat that holds the substrate and transfers heat.

This part is not a hot-pressing die, not a heat-treatment furnace liner, and not a mould-release coating. It is a high-purity process component, made to drawing.

ESGRAF machines susceptors, discs, platens and boats from high-purity isostatic graphite. State the process (epitaxy, CVD, LPCVD), atmosphere, temperature, geometry and purity requirement to quote.

## Processes
- Silicon or SiC epitaxy
- CVD and LPCVD
- Wafer support and heating

## Challenges
- Wafer contamination by particles or impurities
- Dimensional drift of the susceptor with cycling
- Insufficient thermal uniformity across the substrate

## Advantages
- High-purity isostatic graphite
- Geometry machined to drawing
- Dimensional stability at temperature

## Limitations
- Oxidation in air at high temperature
- An SiC coating or ppm-level purification is reviewed against the available grade; it is not assumed from the catalog
- The reactor electrical and thermal design is set by the tool, not by the material alone

- [Applications](https://esgraf.com/en/applications)
- [Alternate](https://esgraf.com/aplicaciones/semiconductores-susceptores)